Product Introduction
This advanced laser system replaces traditional diffusion and chemical doping methods with a clean, contact-free, and controllable laser-based process, significantly improving productivity, yield, and environmental sustainability.
Advantages
Square Top-Hat Doping Spot, Optional Size 80-120μm
High-speed and high-precision scanning system for precise alignment of gridlines;
Dual detection system for loading and unloading, boosting the production of high-quality battery cells;
Option for manual or AGV automated loading and unloading.
Working Principle
The laser phosphorus doping process utilizes high-energy laser beams to locally melt or modify the silicon surface. During this process, a controlled amount of phosphorus atoms are introduced and diffused into the silicon substrate.
The equipment uses a high-precision optical system and real-time temperature control to maintain uniform doping depth and concentration.
With the aid of multi-axis motion platforms, CCD vision alignment, and automatic focusing systems, the machine guarantees consistent phosphorus distribution and repeatable results across large wafer surfaces.
This results in stable electrical performance, minimal damage to the substrate, and improved efficiency in solar cell production.
Technical Specifications & Processing Advantages
Technical Parameters
Laser type | Ultraviolet Laser/Green Laser/Infrared Laser |
Processing area | 166mmx166mm--230mmx230mm (customized) |
Machine size | 4500mmx1300mmx2200mm (Prevail in kind) |
Machine processing accuracy | ≤0.02mm |
Electric power loading | 3KW |
Machine weight | 4000KG |
Environment requirements Temperature/Humidity | Humidity :30% to 60%, no condensation
Temperature :22℃±2 |
Sample Display
Key Features
Fully Automated Operation – From wafer loading to doping and unloading, all processes are controlled by an intelligent automation system, minimizing manual intervention.
High Precision Doping – Laser beam control and feedback ensure uniform phosphorus diffusion with micron-level accuracy.
Non-Contact Process – The laser-based method eliminates mechanical contact, reducing contamination and surface damage.
Energy Efficient and Eco-Friendly – The process requires no chemical dopants or waste, aligning with green manufacturing standards.
Smart Optical Control System – Integrated vision inspection and real-time monitoring for precise alignment and stability.
Scalable Design – Compatible with various wafer sizes and customizable for different production lines.
High Throughput – Optimized beam scanning and automation enable continuous, stable mass production.
Data Integration & Traceability – Supports MES system connectivity for production traceability and performance tracking.
Applications
The Fully Automated Laser phosphorus doping machine is ideal for use in:
Solar Photovoltaic Manufacturing – For selective emitter formation and surface doping of silicon solar cells.
Semiconductor Industry – For n-type region formation in silicon-based electronic devices.
New Energy Battery Production – For conductive layer enhancement and performance improvement.
Microelectronics – For localized doping in precision semiconductor components.
Research and Development – For universities, laboratories, and institutes exploring next-generation energy materials.
FAQs (Frequently Asked Questions)
Q1: What is phosphorus doping and why is it important in solar cells?
A1: Phosphorus doping introduces phosphorus atoms into the silicon wafer to create an n-type semiconductor region. This improves electrical conductivity and enhances the solar cell’s conversion efficiency.
Q2: How does a laser doping system differ from traditional diffusion methods?
A2: Unlike thermal diffusion, laser doping uses localized laser energy to achieve selective doping without high-temperature furnaces. It is faster, more precise, and environmentally friendly.
Q3: What materials can this equipment process?
A3: It is mainly designed for mono-crystalline and polycrystalline silicon wafers, but can also be adapted for certain semiconductor or thin-film substrates.
Q4: Can the system be customized for specific production lines?
A4: Yes. Inte Laser provides tailored solutions including optical configurations, motion control systems, and automation integration to fit customer requirements.
Q5: What is the expected maintenance frequency?
A5: The system is designed for continuous operation with minimal maintenance. Routine cleaning and laser calibration every few months are typically sufficient.
Q6: Does Inte Laser provide training and technical support?
A6: Absolutely. We provide comprehensive operator training, on-site commissioning, and lifetime technical support to ensure optimal machine performance.
Q7: How can the machine improve production efficiency?
A7: Automation, intelligent scanning, and precise laser control significantly shorten cycle time and reduce defects, enabling higher output with consistent quality.
Conclusion
The Fully Automated Laser Phosphorus Doping Machine by Inte Laser is a powerful, eco-friendly, and intelligent solution for new energy and semiconductor manufacturing.
It redefines efficiency, precision, and automation in the doping process — helping manufacturers achieve higher productivity, better product performance, and sustainable growth.
Backed by Inte Laser’s technical expertise and strong after-sales service, this system is the ideal choice for enterprises aiming to upgrade to smart, high-precision laser manufacturing in the era of Industry 4.0.
Phone